No 1, Vol. 4, 2001 


M. Ramm¹, M. Ata¹, Th. Gross² and W. Unger²

1 Sony Corporation Frontier Science Laboratories,
2-1-1, Shinsakuragaoka, Hodogaya-ku,
Yokohama 240-0036, Japan
2 Bundesanstalt für Materialforschung und -prüfung,
Unter den Eichen 44-46 D-12203 Berlin, Germany


We studied the polymerization of C60 under different Ar plasma conditions. Films were either deposited in the pressure range between 1.3 and 40 Pa applying input power of 50 W or evaporated C60 films were exposed to Ar plasma of 30 and 50 W. The films were investigated by Raman spectroscopy, X-ray photoelectron spectroscopy (XPS) and carbon K near-edge X-ray-absorption fine structure spectroscopy (NEXAFS). The films were non-uniform and consisted of unpolymerized C60, dimers, linear chains and polymeric planes. In comparison with evaporated C60 the XPS C 1s peak is broader and asymmetric for the C60 polymer and its shake-up satellites diminished. Furthermore, the features of the valence band as well as the features of the π* antibonding orbitals of the C60 polymer are broader and reduced in intensity.

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