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Nanocomposite materials electroplating for nano- and micro-fabrication with
Si mold and LIGA-like technological process is proposed. UV lithography based on
SU-8 photoresist for ultra-thick 3D structures is described. Two-stage process for high aspect
ratio vertical metal structures fabrication is considered. Possible applications of the proposed
technological approaches for advanced optical systems are described.
Keywords: nanocomposite electroplating, nanostructured material, optical system, photoresist |
full paper (pdf, 912 Kb)