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Evolution of plasma torch at the surface of some metals (Cu, Al, Sn, Pb) induced
by varying external electric field of different polarity from 0 to 106
V/m-1 in the course of
laser processing with the mean radiation flux density ∼ 106 W/cm-2
is studied. A size of the
target material droplets, carried out from the irradiated zone, becomes several times less, as
the field strength amplitude grows, independently of the field polarity.
Keywords: fast holographic filming, laser radiation, strip projection method |
full paper (pdf, 1456 Kb)