Rev.Adv.Mater.Sci. (RAMS)
No 2, Vol. 33, 2013, pages 157-163


Danlu Song and Yan Li


Laser Induced Chemical Liquid Deposition (LCLD) is the technology using thermal effect and luminous effect of laser to enhance and stimulate the chemical plating process in order to get micro-area plating on metal or semiconductor substrate without mask. A new type of RP system graph based on LCLD and its work process are introduced on detail. The process of LCLD is controlled by thermal transfer if the heights of liquid and metallic material are changeless. The thermodynamics model of the region of laser facular in the reaction process during LCLD is established, the spatial distribution and changing of temperatures in part area are studied, and the engineering analysis software is adopted to solve and emulate the model. On the basis of theoretic analysis, the researches on the LCLD metal depositing are developed on the experimental system according to the techniques and scan strategy of RP. The main parameter indexes of the experimental system are: 50 w optical fiber coupling semiconductor laser, three-axis linkage 3D plat with positioning accuracy of 0.05 mm. These researches can lead to the conclusion that the highest temperature of plating liquid can be found if the diameter of the facular laser beam is unchangeable. The relation between temperature and power of laser is linear on the whole. The locomotory speed of the laser beam does little influence on temperature of plating liquid; the thermal area of plating liquid influenced by laser is very small; the temperature in the thermal area is asymmetrical. The results make clear that the process of the LCLD-RP can carry through under the normal temperature and pressure, it is a kind of 3D solid shape manufacturing technology which can support the metal and alloy shape directly and has higher applied value.

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