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In this work, conjugated block copolymer polyfluorene/polyaniline (PF/PANI) has been studied as a potential
candidate for photovoltaic applications. We used two techniques based on nanoimprint lithography (NIL) for phase
alignment of this block copolymer blend PF/PANI, polyaniline being the donor and polyfluorene - the acceptor phase.
In the first technique, metallic nanostructures induce nanostructuring in the polymer layer, whereas in the second
technique, the PF/PANI is directly patterned with a stamp. The electrical and photoelectrical properties of the
polymeric systems were studied and the morphology was characterized by AFM and SEM.
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